LiNbO3 phase gratings prepared by a single excimer pulse through a silica phase mask

A transmission silica phase mask grating was used to fabricate LiNbO3 wafer phase gratings by a single excimer pulse at 248 nm. The morphologies of the LiNbO3 wafer gratings were studied with an atomic force microscope as well as an optical microscope, The crystal structures of the gratings were characterized by x-ray diffraction and three new cn;stal phases were found at the gratings' surface besides the substrate phase of LN (110). (C) American Institute of Physics.