Origin of the blue photoluminescence from SiO2(SiC)/SiC on Si substrate

被引:12
作者
Chen, Zheng [1 ]
Wang, Yuxia [1 ]
Zou, Youming [1 ]
Wang, Jianwen [1 ]
Li, Yun [1 ]
Zhang, Hongjuan [1 ]
机构
[1] Univ Sci & Technol China, Dept Mat Sci & Engn, Hefei 230026, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1063/1.2360231
中图分类号
O59 [应用物理学];
学科分类号
摘要
SiC film is prepared by heating the polystyrene/Si in 1 atm ambient Ar at 1270 degrees C. The as-grown SiC film is characterized by scanning electron microscopy, x-ray diffraction, and x-ray photoelectron spectroscopy. Based on the results, it is suggested that a SiO2(SiC) layer is located on the top of the as-grown SiC film. A blue photoluminescence band is observed from the as-grown sample. The photoluminescence band has the same origin as those from silica nanowires and SiC nanostructures and is associated with the near interface traps at the interface of SiO2/SiC or SiO2/Si. (c) 2006 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 24 条
[1]
Band alignment and defect states at SiC/oxide interfaces [J].
Afanas'ev, VV ;
Ciobanu, F ;
Dimitrijev, S ;
Pensl, G ;
Stesmans, A .
JOURNAL OF PHYSICS-CONDENSED MATTER, 2004, 16 (17) :S1839-S1856
[2]
Photoionization of silicon particles in SiO2 [J].
Afanas'ev, VV ;
Stesmans, A .
PHYSICAL REVIEW B, 1999, 59 (03) :2025-2034
[3]
Interfacial defects in SiO2 revealed by photon stimulated tunneling of electrons [J].
Afanas'ev, VV ;
Stesmans, A .
PHYSICAL REVIEW LETTERS, 1997, 78 (12) :2437-2440
[4]
Afanas'ev VV, 1997, PHYS STATUS SOLIDI A, V162, P321, DOI 10.1002/1521-396X(199707)162:1<321::AID-PSSA321>3.0.CO
[5]
2-F
[6]
Shallow electron traps at the 4H-SiC/SiO2 interface [J].
Afanas'ev, VV ;
Stesmans, A ;
Bassler, M ;
Pensl, G ;
Schulz, MJ .
APPLIED PHYSICS LETTERS, 2000, 76 (03) :336-338
[7]
Study of the phase separation in amorphous silicon oxycarbide glasses under heat treatment [J].
Brequel, H ;
Parmentier, J ;
Soraru, GD ;
Schiffini, L ;
Enzo, S .
NANOSTRUCTURED MATERIALS, 1999, 11 (06) :721-731
[8]
Fan JY, 2006, APPL PHYS A-MATER, V82, P485, DOI 10.1007/s00339-004-3445-9
[9]
Phase separation in an SiCO class studied by transmission electron microscopy and electron energy-loss spectroscopy [J].
Kleebe, HJ ;
Turquat, C ;
Sorarù, GD .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2001, 84 (05) :1073-1080
[10]
Defects in SiO2 as the possible origin of near interface traps in the SiC/SiO2 system:: A systematic theoretical study -: art. no. 115323 [J].
Knaup, JM ;
Deák, P ;
Frauenheim, T ;
Gali, A ;
Hajnal, Z ;
Choyke, WJ .
PHYSICAL REVIEW B, 2005, 72 (11)