Following local adsorption sites through a surface chemical reaction:: CH3SH on Cu(111)

被引：96

作者：

Jackson, GJ ^{[1
]}

Woodruff, DP

Jones, RG

Singh, NK

Chan, ASY

Cowie, BCC

Formoso, V

机构：

[1] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England

[2] Univ Nottingham, Sch Chem, Nottingham NG7 2RD, England

[3] Univ New S Wales, Sch Chem, Kensington, NSW 2033, Australia

[4] CLRC, Daresbury Lab, Warrington WA4 4AD, Cheshire, England

[5] European Synchrotron Radiat Facil, F-38043 Grenoble, France

来源：

PHYSICAL REVIEW LETTERS | 2000年 / 84卷 / 01期

关键词：

D O I：

10.1103/PhysRevLett.84.119

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Studying the interaction of CH3SH, methanethiol, with Cu(111) as a model system, we demonstrate the ability of chemical-shift normal incidence x-ray standing wave field measurements to identify the local adsorption geometries of coadsorbed reaction products at different temperatures, a technical problem of broad chemical significance. In the present case the local geometries of four distinct S-containing adsorbate species (intact CH3SH, two thiolate (CH3S-) reaction intermediates and atomic S) are determined.

引用

页码：119 / 122

页数：4

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