Analytical model for optical functions of amorphous semiconductors and its implications for thin film solar cells

被引:38
作者
Ferlauto, AS
Ferreira, GM
Pearce, JM
Wronski, CR
Collins, RW
Deng, X
Ganguly, G
机构
[1] Penn State Univ, Dept Phys, University Pk, PA 16802 USA
[2] Penn State Univ, Mat Res Inst, University Pk, PA 16802 USA
[3] Univ Toledo, Dept Phys & Astron, Toledo, OH 43606 USA
[4] BP Solar, Toano, VA 23168 USA
关键词
amorphous semiconductors; dielectric function parameterization; Tauc-Lorentz formula; amorphous silicon (a-Si : H) alloys; amorphous silicon solar cells;
D O I
10.1016/j.tsf.2003.11.234
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have developed a Kramers-Kronig consistent analytical expression to fit the dielectric functions (epsilon(1), epsilon(2)) of hydrogenated amorphous silicon (a-Si:H)-based alloys measured using a combination of photoconductivity, transmission and reflection, and ellipsometric spectroscopies. The alloys of interest include amorphous silicon-germanium (a-Si1-xGex:H) and silicon-carbon (a-Si1-xCx:H), with optical bandgaps ranging from similar to 1.30 to 1.95 eV. The fit can be performed simultaneously throughout the following regions: (i) the sub-bandgap (or Urbach tail) region where the absorption coefficient increases exponentially with photon energy, GO the band-to-band onset region where transitions are assumed to occur between parabolic bands with constant dipole matrix element, and (iii) the above-bandgap region where a Lorentz oscillator model is applicable. We describe an approach whereby, from a single accessible measure of the optical bandgap, (epsilon(1), epsilon(2)) can be generated for a sample set consisting of optimum electronic quality a-Si:H-based alloys prepared by plasma-enhanced chemical vapor deposition. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:388 / 392
页数:5
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