Three-dimensional nanostructure construction via nanografting: Positive and negative pattern transfer

被引：73

作者：

Liu, JF

Cruchon-Dupeyrat, S

Garno, JC

Frommer, J

Liu, GY ^{[1
]}

机构：

[1] Univ Calif Davis, Dept Chem, Davis, CA 95616 USA

[2] Wayne State Univ, Dept Chem, Detroit, MI 48202 USA

[3] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

来源：

NANO LETTERS | 2002年 / 2卷 / 09期

关键词：

D O I：

10.1021/nl025670c

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Three-dimensional nanostructures can be constructed using scanning probe lithography in combination with selective surface reactions. This letter introduces a successful approach using AFM-based nanografting to produce two-dimensional nanopatterns within self-assembled monolayer resists. These nanopatterns serve as an anchor to construct nanostructures in the third dimension via surface reactions. In this way, the nanometer-scale 2D pattern is transferred to chemically distinct 3D nanostructures. This approach offers the advantages of high spatial precision and selectivity in pattern transfer.

引用

收藏

页码：937 / 940

页数：4

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