Modeling Cu thin film growth

被引：57

作者：

Adams, JB ^{[1
]}

Wang, ZY

Li, YH

机构：

[1] Arizona State Univ, Dept Chem Biochem & Mat Engn, Tempe, AZ 85287 USA

[2] Arizona State Univ, Sch & Engn Mat Program, Tempe, AZ 85287 USA

来源：

THIN SOLID FILMS | 2000年 / 365卷 / 02期

关键词：

thin film growth; molecular dynamics; energy minimization; Monte Carlo methods;

D O I：

10.1016/S0040-6090(99)01047-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A general overview of methods of modeling thin film growth on an atomic scale is provided, focusing on molecular dynamics (MD), energy minimization, and Monte Carlo methods. We emphasize how different methods can be integrated to provide a more powerful predictive capability. We give examples of how one can use atomic-level information to predict nucleation rates and facet growth rates of Cu islands. (C) 2000 Elsevier Science S.A. All rights reserved.

引用

页码：201 / 210

页数：10

共 34 条

[1] ATOMIC-LEVEL COMPUTER-SIMULATION [J].

ADAMS, JB ;

ROCKETT, A ;

KIEFFER, J ;

XU, W ;

NOMURA, M ;

KILIAN, KA ;

RICHARDS, DF ;

RAMPRASAD, R .

JOURNAL OF NUCLEAR MATERIALS, 1994, 216 :265-274

[2]

[Anonymous], COMMUNICATION

[3] Models for diffusion and island growth in metal monolayers [J].

Biham, O ;

Furman, I ;

Karimi, M ;

Vidali, G ;

Kennett, R ;

Zeng, H .

SURFACE SCIENCE, 1998, 400 (1-3) :29-43

[4] Self-diffusion of adatoms, dimers, and vacancies on Cu(100) [J].

Boisvert, G ;

Lewis, LJ .

PHYSICAL REVIEW B, 1997, 56 (12) :7643-7655

[5] MIGRATION OF CU ADATOMS ON A CU(100) SURFACE, STUDIED WITH LOW-ENERGY ION-SCATTERING (LEIS) [J].

BREEMAN, M ;

BOERMA, DO .

SURFACE SCIENCE, 1992, 269 :224-228

[6] ANNEALING OF CU-ADATOM CONFIGURATIONS ON CU(100) [J].

BREEMAN, M ;

BARKEMA, GT ;

BOERMA, DO .

SURFACE SCIENCE, 1994, 303 (1-2) :25-35

[7]

BREEMAN M, 1993, THESIS GRONINGEN U

[8]

CARLSSON AE, 1990, SOLID STATE PHYSICS, V43

[9]

CARTULA MJ, 1996, PHYS REV B, V54, P16683

[10]

CHANG SL, 1994, CRIT REV SURF CHEM, V3, P239

← 1 2 3 4 →