Monte Carlo simulations of Meyer-Neldel effect on carrier time-of-flight in a-Si:H

被引:15
作者
Chen, WC
Hamel, LA
Yelon, A
机构
[1] UNIV MONTREAL, DEPT PHYS, GRP RECH PHYS & TECHNOL COUCHES MINCES GCM, MONTREAL, PQ H3C 3J7, CANADA
[2] ECOLE POLYTECH, DEPT GENIE PHYS, GRP RECH PHYS & TECHNOL COUCHES MINCES GCM, MONTREAL, PQ H3C 3A7, CANADA
关键词
D O I
10.1016/S0022-3093(97)00260-3
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We present Monte Carlo simulations of multiple-trapping transport with Meyer-Neldel effect in a-Si:H assuming exponential band tails. The transit time, t(T), and the dispersion parameters, alpha(1) and alpha(2), before and after the transit time, are extracted from the simulated currents. The simulations show that including the Meyer-Neldel effect improves the agreement of alpha(1) and alpha(2) with experimental data, both at low and high temperatures and fits the time-of-flight drift mobility measurements. Best fits to the data yield T-0=263 K, T-MN=464 K, nu(00)=5X10(9) s(-1) and mu(0)=4 cm(2) V-1 s(-1) for electrons and T-0=409 K, T-MN=809 K, nu(00)=6.5X10(10) s(-1) and mu(0)=0.5 cm(2) V-1 s(-1) for holes. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:254 / 260
页数:7
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