Influence of H-2 on electrical and optical properties of carbon-doped InP grown by MOMBE using tertiarybutylphosphine (TBP)

被引:4
作者
Oh, JH [1 ]
Fukuchi, F [1 ]
Kang, HC [1 ]
Konagai, M [1 ]
机构
[1] TOKYO INST TECHNOL,DEPT ELECT & ELECTR ENGN,MEGURO KU,TOKYO 152,JAPAN
关键词
D O I
10.1016/0022-0248(96)00015-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The influence of the introduction of H-2 during growth on electrical and optical properties of carbon-doped InP is discussed. The existence of H-2 in the cracker affects the tertiarybutylphosphine (TBP) cracking behavior. According to the initial mass spectroscopic study, it was found that the decomposition of carbon-containing species originating from TBP is enhanced when they are cracked in ambient H-2. As a result, the increase of the electron concentration of InP grown under the introduction of H-2 is presumably attributed to the increase of the incorporation of a carbon donor. It was also found that a phosphorus polymer, which contributes to the epitaxial growth of InP, in the direct beam cracked under H-2, is slightly decreased. This leads to the reduction of an effective V/III ratio on the growing surface and may be responsible for the drastic change in the PL characteristics.
引用
收藏
页码:425 / 429
页数:5
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