Comparative study of drain-current collapse in AlGaN/GaN high-electron-mobility transistors on sapphire and semi-insulating SiC

被引:52
作者
Arulkumaran, S [1 ]
Egawa, T [1 ]
Ishikawa, H [1 ]
Jimbo, T [1 ]
机构
[1] Nagoya Inst Technol, Res Ctr Microstruct Devices, Showa Ku, Nagoya, Aichi 4668555, Japan
关键词
D O I
10.1063/1.1512820
中图分类号
O59 [应用物理学];
学科分类号
摘要
The drain-current collapse at high drain voltage has been studied in AlGaN/GaN high-electron-mobility transistors (HEMTs) on both semi-insulating (SI)-SiC and sapphire substrates using small frequency (120 Hz) sinusoidal wave superimposed dc I-DS-V-DS characteristics. Low drain-current collapses were observed in AlGaN/GaN HEMTs on SI-SiC substrate when compared with the HEMTs on sapphire substrates. Two and three thermally activated deep traps were observed on SiC-based and sapphire-based HEMTs, respectively. The existence of an additional deep trap (DeltaE=0.61 eV) could be associated with the material defects/ dislocations responsible for the severe drain current collapse in sapphire-based HEMTs. The white-light illuminated I-DS-V-DS characteristics support the existence of more number of deep traps in the sapphire-based HEMTs. (C) 2002 American Institute of Physics.
引用
收藏
页码:3073 / 3075
页数:3
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