Fluorescence measurements of nanopillars fabricated by high-aspect-ratio nanoprint technology

被引：34

作者：

Kuwabara, K ^{[1
]}

Ogino, M ^{[1
]}

Motowaki, S ^{[1
]}

Miyauchi, A ^{[1
]}

机构：

[1] Hitachi Ltd, Hitachi Res Lab, Hitachi, Ibaraki 3191292, Japan

来源：

MICROELECTRONIC ENGINEERING | 2004年 / 73-4卷

关键词：

nanoprint; nanoimprint; nanopillar; immunoassay; high-aspect-ratio structure;

D O I：

10.1016/j.mee.2004.03.047

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Nanoprinting has attracted attention as a low cost nanoscale fabrication method. We have succeeded in for-Ming high-aspect-ratio structures (nanopillars) with diameters of 250-1000 nm and heights of I mum using high-aspect-ratio nanoprint (Hi-NP) technology. The size of these structures is comparable to that of macromolecules such as DNA and proteins. We propose the application of these nanopillars to immunoassay chips. We demonstrated the coating of nanopillars with fluorescein isothiocyanate (FITC) conjugated bovine serum albumin (BSA) and measured the fluorescence intensity emitted from the chip. The fluorescence from each nanopillar was observed and the results indicated that FITC conjugated BSA had connected to each nanopillar. The nanopillar area showed fluorescence intensity 2.3 times stronger than that of the flat area. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：752 / 756

页数：5