Reversible stress relaxation during precoalescence interruptions of Volmer-Weber thin film growth

被引：117

作者：

Friesen, C ^{[1
]}

Thompson, CV ^{[1
]}

机构：

[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

来源：

PHYSICAL REVIEW LETTERS | 2002年 / 89卷 / 12期

关键词：

D O I：

10.1103/PhysRevLett.89.126103

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

From in situ stress measurements, we have observed that a large component of the precoalescence compressive stress that develops during Volmer-Weber growth of polycrystalline Cu films relaxes reversibly. This phenomenon is similar to the reversible stress relaxation previously observed in the postcoalescence regime. We have also observed that less than a tenth of a monolayer of deposition leads to an instantaneous stress of order 1 GPa. The stress changes in both the precoalescence and postcoalescence regimes of growth are explained by changes in the adatom population during and after deposition.

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页码：126103 / 126103

页数：4

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