Latest developments for the CAMECA ULE-SIMS instruments: IMS Wf and SC-Ultra

被引：6

作者：

de Chambost, E ^{[1
]}

Merkulov, A ^{[1
]}

Peres, P ^{[1
]}

Rasser, B ^{[1
]}

Schuhmacher, M ^{[1
]}

机构：

[1] CAMECA SA, F-92400 Courbevoie, France

来源：

APPLIED SURFACE SCIENCE | 2004年 / 231卷

关键词：

SIMS boron; implant; dose; mapping; repeatability;

D O I：

10.1016/j.apsusc.2004.03.202

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

SIMS depth profiles for full wafer analyses were carried out on the CAMECA IMS Wf instrument. Experiments have been performed in order to investigate the analytical performance of this SIMS instrument for shallow, medium and deep profiles in terms of measurement repeatability and sample throughput. First results using a cassette loader option implemented on the IMS Wf are presented. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：949 / 953

页数：5