Thermally evaporated ZrO2

被引:13
作者
Bhaskaran, M [1 ]
Swain, PK
Misra, D
机构
[1] Sarnoff Corp, Princeton, NJ 08543 USA
[2] New Jersey Inst Technol, Dept Elect & Comp Engn, Newark, NJ 07102 USA
关键词
D O I
10.1149/1.1701587
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The characteristics of zirconium oxide (ZrO2) films, grown by standard thermal evaporation of zirconium while adding oxygen at constant partial pressure during evaporation, were investigated for the first time. The physical thickness (t(phys) in Angstrom) and electrical thickness of the as-grown and annealed samples were studied. The dielectric constant as measured by the capacitance-voltage (C-V) technique is estimated to be around 36. C-V measurements taken at 100 kHz show a low hysteresis of similar to30 mV and the maximum capacitance seems to flatten out for the lower physical thickness, which might indicate presence of an interfacial oxide/silicate layer. (C) 2004 The Electrochemical Society.
引用
收藏
页码:F39 / F41
页数:3
相关论文
共 12 条
[1]   Characterization of zirconia films deposited by rf magnetron sputtering [J].
Ben Amor, S ;
Rogier, B ;
Baud, G ;
Jacquet, M ;
Nardin, M .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1998, 57 (01) :28-39
[2]   Densification and aging of ZrO2 films prepared by sol-gel [J].
Brenier, R ;
Gagnaire, A .
THIN SOLID FILMS, 2001, 392 (01) :142-148
[3]   Highly conformal ZrO2 deposition for dynamic random access memory application [J].
Chang, JP ;
Lin, YS .
JOURNAL OF APPLIED PHYSICS, 2001, 90 (06) :2964-2969
[4]   Rapid thermal chemical vapor deposition of zirconium oxide for metal-oxide-semiconductor field effect transistor application [J].
Chang, JP ;
Lin, YS ;
Chu, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (05) :1782-1787
[5]   Influence of sputtering pressure on the structure and properties of ZrO2 films prepared by rf reactive sputtering [J].
Gao, PT ;
Meng, LJ ;
dos Santos, MP ;
Teixeira, V ;
Andritschky, M .
APPLIED SURFACE SCIENCE, 2001, 173 (1-2) :84-90
[6]  
HUFF H, 2001, INT EL DEV M, P123
[7]   Electrical characteristics and thermal stability of n+ polycrystalline-Si/ZrO2/SiO2/Si metal-oxide-semiconductor capacitors [J].
Lim, KY ;
Park, DG ;
Cho, HJ ;
Kim, JJ ;
Yang, JM ;
Choi, IS ;
Yeo, IS ;
Park, JW .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (01) :414-419
[8]   Influence of ion energy and arrival rate on x-ray crystallographic properties of thin ZrOx films prepared on Si(111) substrate by ion-beam assisted deposition [J].
Matsuoka, M ;
Isotani, S ;
Chubaci, JFD ;
Miyake, S ;
Setsuhara, Y ;
Ogata, K ;
Kuratani, N .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (06) :3773-3775
[9]   Materials characterization of ZrO2-SiO2 and HfO2-SiO2 binary oxides deposited by chemical solution deposition [J].
Neumayer, DA ;
Cartier, E .
JOURNAL OF APPLIED PHYSICS, 2001, 90 (04) :1801-1808
[10]  
Ramamurthy S, 1998, B ELECTROCHEM, V14, P446