Antireflection coatings for UV radiation obtained by molecular-beam deposition

被引：13

作者：

Laux, S ^{[1
]}

Mann, K ^{[1
]}

Granitza, B ^{[1
]}

Kaiser, U ^{[1
]}

Richter, W ^{[1
]}

机构：

[1] LASER LAB GOTTINGEN EV,D-37077 GOTTINGEN,GERMANY

来源：

APPLIED OPTICS | 1996年 / 35卷 / 31期

关键词：

molecular-beam deposition; antireflection coatings; UV; fluorides; laser-induced damage threshold;

D O I：

10.1364/AO.35.006216

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have developed fluoride antireflection (AR) coatings on MgF2 substrates for a wavelength of 248 nm by molecular-beam deposition. Transmission and laser-induced damage threshold of the samples were measured and atomic force microscope (AFM) investigations were carried out. We compare a 14-layer design for AR coatings with sublayer thicknesses of 12 nm with a conventional two-layer design with quarter-wavelength thicknesses. The laser-induced damage threshold of the 14-layer coating is slightly higher than that of the two-layer coating. The AFM surface images show that the 14-layer coating has a smoother surface than the two-layer coating. (C) 1996 Optical Society of America

引用

页码：6216 / 6218

页数：3

共 18 条

[1]

IZAWA T, 1990, SPIE, V1441, P339

[2] HIGH DAMAGE THRESHOLD AL2O3/SIO2 DIELECTRIC COATINGS FOR EXCIMER LASERS [J].