Photocatalytic reduction of CO2 with H2O on Ti-containing porous silica thin film photocatalysts

被引：77

作者：

Ikeue, K

Nozaki, S

Ogawa, M

Anpo, M

机构：

[1] Univ Osaka Prefecture, Grad Sch Engn, Dept Appl Chem, Sakai, Osaka 5998531, Japan

[2] Waseda Univ, Dept Earth Sci, Shinjuku Ku, Tokyo 1698050, Japan

来源：

CATALYSIS LETTERS | 2002年 / 80卷 / 3-4期

关键词：

mesoporous thin film; reduction of CO2; photocatalyst; formation of CH3OH; quantum yield;

D O I：

10.1023/A:1015400223708

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Two different Ti-containing porous silica thin films having a hexagonal and cubic pore structure were synthesized and used as photocatalysts for the reduction of CO2 with H2O at 323 K. UV irradiation of the Ti-containing porous silica thin films in the presence of CO2 and H2O led to the formation of CH4 and CH3OH with a high quantum yield of 0.28%. These porous silica thin film photocatalysts having a hexagonal pore structure exhibited higher reactivity than the Ti-MCM-41 powder photocatalysts with the same pore structure.

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收藏

页码：111 / 114

页数：4

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