Micromachining of high-contrast optical waveguides in ⟨111⟩ silicon wafers

被引：16

作者：

Pandraud, G ^{[1
]}

Veldhuis, G

Berenschot, JW

Nijdam, AJ

Hoekstra, HJWM

机构：

[1] Bookham Technol Ltd, Abingdon OX14 4RY, Oxon, England

[2] Univ Twente, MESA Res Inst, NL-7500 AE Enschede, Netherlands

[3] Univ St Etienne, CNRS, UMR 5516, Lab TSI, F-42023 St Etienne, France

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 2000年 / 12卷 / 03期

关键词：

etching; integrated optics; silicon; waveguides; sensors;

D O I：

10.1109/68.826923

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a {111} silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.

引用

页码：308 / 310

页数：3

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