Influence of intensive light exposure on polymer field-effect transistors

被引:39
作者
Ficker, J
von Seggern, H
Rost, H
Fix, W
Clemens, W
McCulloch, I
机构
[1] PolyIC GmbH & Co KG, D-91052 Erlangen, Germany
[2] Tech Univ Darmstadt, Inst Mat Sci, Darmstadt, Germany
[3] Merck Chem, Southampton, Hants, England
关键词
D O I
10.1063/1.1784547
中图分类号
O59 [应用物理学];
学科分类号
摘要
The influence of intensive light exposure on high performance polymer field-effect transistors containing highly regioregular poly(3-alkylthiophene) as a semiconductor is reported. While the transistors show high stability under ambient air and light, a distinct degradation upon exposure to intensive light could be detected by its impact on the on currents. UV-Vis spectra were used to interpret the current decrease as being caused by a decrease of the conjugation length of the semiconductor, which is supported by IR spectrometry. The role of ambient air, in particular, oxygen, in the degradation process is shown. (C) 2004 American Institute of Physics.
引用
收藏
页码:1377 / 1379
页数:3
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