A model for the chemical vapor deposition of poly(para-xylylene) (parylene) thin films

被引:107
作者
Fortin, JB [1 ]
Lu, TM [1 ]
机构
[1] Rensselaer Polytech Inst, Ctr Integrated Elect & Elect Mfg, Troy, NY 12180 USA
关键词
D O I
10.1021/cm010454a
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A kinetic model is developed for the chemical vapor deposition of poly(para-xylylene), or parylene, thin polymer films. The growth process is modeled as a multistep process that includes physisorption of monomer on the surface and subsequent chemisorption. The chemisorption step is equivalent to a propagation reaction between the monomer and a radical chain end, and each chemisorption produces a new chemisorption site. The sticking coefficient of the monomer as a function of substrate temperature is extracted from the measured data using the model and is determined to be 2.0 x 10(-5) at 60 degreesC, increasing to 1.4 x 10(-3) at -60 degreesC. The heat of physisorption for the monomer is also extracted from the experiment, and the value found (75 kJ/mol) is reasonable when compared to those of other similar molecules. The model fits experimental kinetic data well for a large range of pressures and temperatures, and it should be appropriate for use with all parylene-family polymers.
引用
收藏
页码:1945 / 1949
页数:5
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