Laser-induced microexplosion confined in a bulk of silica: Formation of nanovoids

被引：111

作者：

Juodkazis, Saulius

Misawa, Hiroaki

Hashimoto, Tomohiro

Gamaly, Eugene G.

Luther-Davies, Barry

机构：

[1] Hokkaido Univ, CREST, JST, Kita Ku, Sapporo, Hokkaido 0010021, Japan

[2] Hokkaido Univ, Res Inst Elect Sci, Kita Ku, Sapporo, Hokkaido 0010021, Japan

[3] Ohara Inc, Sagamihara, Kanagawa 2291186, Japan

[4] Australian Natl Univ, Res Sch Phys Sci & Engn, Laser Phys Ctr, Canberra, ACT 0200, Australia

来源：

APPLIED PHYSICS LETTERS | 2006年 / 88卷 / 20期

关键词：

D O I：

10.1063/1.2204847

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on the nanovoid formation inside synthetic silica, viosil, by single femtosecond pulses of 30-100 nJ energy, 800 nm wavelength, and 180 fs duration. It is demonstrated that the void is formed as a result of shock and rarefaction waves at pulse power much lower than the threshold of self-focusing. The shock-compressed region around the nanovoid is demonstrated to have higher chemical reactivity. This was used to reveal the extent of the shock-compressed region by wet etching. Application potential of nanostructuring of dielectrics is discussed. (c) 2006 American Institute of Physics.

引用

页数：3

共 26 条

[1] Atomistic simulation of shock wave-induced melting in argon [J].