Recombination-enhanced diffusion of self-interstitial atoms and vacancy-interstitial recombination in diamond

被引:57
作者
Newton, ME
Campbell, BA
Twitchen, DJ
Baker, JM
Anthony, TR
机构
[1] Kings Coll London, Dept Phys, London WC2R 2LS, England
[2] Univ Oxford, Clarendon Lab, Oxford OX1 3PU, England
[3] GE Co, Corp Res & Dev, Schenectady, NY 12309 USA
基金
英国工程与自然科学研究理事会;
关键词
diamond; diffusion; radiation damage; vacancy-interstitial recombination;
D O I
10.1016/S0925-9635(01)00623-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper we report the results of EPR and optical studies on vacancies and interstitials produced in type IIa diamond irradiated with 2-MeV electrons at temperatures between 90 and 900 K. Post-irradiation annealing studies at temperatures up to 1900 K were also performed. Data showing recombination-enhanced diffusion of self-interstitial atoms in diamond is presented and our analysis of the phenomena leads us to the conclusion that a highly mobile interstitial I* (possibly a charged/neutral T-d interstitial) is produced by electronic excitation and/or charge transfer. We estimate that the migration energy for I* is 0.3 eV. No evidence for vacancy recombination-enhanced diffusion was observed. The experimental data confirms that there is a significant barrier to vacancy-interstitial recombination in diamond. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:618 / 622
页数:5
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