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The interaction of NO with stepped Rh surfaces
被引:24
作者:
Janssen, NMH
Cholach, AR
Ikai, M
Tanaka, K
Nieuwenhuys, BE
机构:
[1] LEIDEN UNIV,GORLAEUS LABS,LEIDEN INST CHEM,NL-2300 RA LEIDEN,NETHERLANDS
[2] RUSSIAN ACAD SCI,BORESKOV INST CATALYSIS,SB,NOVOSIBIRSK 630090,RUSSIA
[3] UNIV TOKYO,INST SOLID STATE PHYS,MINATO KU,TOKYO 106,JAPAN
关键词:
nitric oxide;
rhodium;
stepped single crystal surfaces;
thermal desorption spectroscopy;
D O I:
10.1016/S0039-6028(97)00141-6
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
The dissociation of NO has been studied on a number of Rh single crystal surfaces consisting of (111) and (100) terraces by means of thermal desorption spectroscopy. The influence of both the surface structure and the presence of atomic nitrogen and atomic oxygen on the dissociation of NO have been investigated. The thermal decomposition of NO, which manifests itself by the formation of N-2, is not surface structure dependent at saturation coverage. The presence of N-ad and O-ad inhibit the dissociation of NO. At an excess of O-ad. NO is formed via recombination of N-ad and O-ad atoms. Atomic nitrogen is more stable on (100) terraces than on (111) terraces. No effect of steps on the N-2 and NO TDS spectra was observed. (C) 1997 Elsevier Science B.V.
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页码:201 / 213
页数:13
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