Supercritical water oxidation of a PCB of 3-chlorobiphenyl using hydrogen peroxide

被引：32

作者：

Hatakeda, K

Ikushima, Y

Ito, S

Saito, N

Sato, O

机构：

[1] Natl. Industrial Research Institute, Miyagino-ku, Sendai 983, Tohoku

来源：

CHEMISTRY LETTERS | 1997年 / 03期

关键词：

D O I：

10.1246/cl.1997.245

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The supercritical water oxidation (SCWO) of a PCB of 3-chlorobiphenyl (1) was carried out at a temperature of 673 K and a pressure of 30 MPa with a flow reactor. The initial concentrations of (1) and hydrogen peroxide ranged from 1.84 X 10(-3) to 8.74 X 10 (-2) M (1 M=1 mol dm (-3)), and 0.181 to 2.67 M, respectively. The decomposition of (1) was higher than 99.9% so long as hydrogen peroxide was stoichiometrically added.

引用

页码：245 / 246

页数：2

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