Nonequilibrium plasma treatment of miscible polystyrene/poly(phenylene oxide) blends

被引:14
作者
Boyd, RD [1 ]
Badyal, JPS [1 ]
机构
[1] UNIV DURHAM,DEPT CHEM,SCI LABS,DURHAM DH1 3LE,ENGLAND
关键词
D O I
10.1021/ma961347i
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Oxidative low-pressure and atmospheric plasma modification of polystyrene/poly(2,6-dimethyl-1,4-phenylene oxide) miscible polymer blend surfaces has been studied using X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The extent and stability of surface oxygenation is found to be critically dependent upon both the type of electrical discharge employed and the bulk polymer blend composition.
引用
收藏
页码:5437 / 5442
页数:6
相关论文
共 36 条
[1]  
[Anonymous], POLYM HDB
[2]  
Beamson G., 1993, Adv. Mater., V5, P778, DOI [DOI 10.1002/ADMA.19930051035, 10.1002/adma.19930051035]
[3]   PREFERENTIAL SURFACE-ADSORPTION IN MISCIBLE BLENDS OF POLYSTYRENE AND POLYVINYL METHYL-ETHER) [J].
BHATIA, QS ;
PAN, DH ;
KOBERSTEIN, JT .
MACROMOLECULES, 1988, 21 (07) :2166-2175
[4]  
BOYD RD, IN PRESS MACROMOLECU
[5]   ELECTRICAL-DISCHARGE TREATMENT OF POLYPROPYLENE FILM [J].
BRIGGS, D ;
KENDALL, CR ;
BLYTHE, AR ;
WOOTTON, AB .
POLYMER, 1983, 24 (01) :47-52
[6]   ESCA APPLIED TO POLYMERS .23. RF GLOW-DISCHARGE MODIFICATION OF POLYMERS IN PURE OXYGEN AND HELIUM-OXYGEN MIXTURES [J].
CLARK, DT ;
DILKS, A .
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1979, 17 (04) :957-976
[7]   ESCA STUDIES OF POLYMERS .13. SHAKE-UP PHENOMENA IN SUBSTITUTED POLYSTYRENES [J].
CLARK, DT ;
DILKS, A .
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1977, 15 (01) :15-30
[8]   COMPOSITION AND MOLECULAR-WEIGHT DEPENDENCE OF THE GLASS-TRANSITION IN POLYSTYRENE POLY(2,6-DIMETHYLPHENYLENE ETHER) BLENDS [J].
DEARAUJO, MA ;
STADLER, R ;
CANTOW, HJ .
POLYMER, 1988, 29 (12) :2235-2243
[9]   CRAZE MICROSTRUCTURE AND MOLECULAR ENTANGLEMENTS IN POLYSTYRENE-POLY(PHENYLENE OXIDE) BLENDS [J].
DONALD, AM ;
KRAMER, EJ .
POLYMER, 1982, 23 (03) :461-465
[10]  
EGGITTO FD, 1990, PLASMA DEPOSITION TR, pCH5