Surface texturing of large area multicrystalline silicon solar cells using reactive ion etching method

被引：130

作者：

Inomata, Y

Fukui, K

Shirasawa, K

机构：

[1] Kyocera Corporation, Gamo-gun, Shiga 529-15, 10-1 Kawai, Gamo-cho

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 1997年 / 48卷 / 1-4期

关键词：

surface texturing; multicrystalline silicon; reactive ion etching;

D O I：

10.1016/S0927-0248(97)00106-2

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

A reactive ion etching method has been applied to form a surface texture of multicrystalline silicon solar cells in order to reduce the surface reflectance. This surface texture has a pyramid-like shape, and aspect ratio of which can be easily controlled by the gas flow ratio. 15 cm x 15 cm multicrystalline silicon solar cells have been fabricated using this texturing method and maximum conversion efficiency of 17.1% has been achieved.

引用

页码：237 / 242

页数：6