Spin-dependent hot electron transport in Co/Cu thin films

被引：89

作者：

Rippard, WH ^{[1
]}

Buhrman, RA ^{[1
]}

机构：

[1] Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA

来源：

PHYSICAL REVIEW LETTERS | 2000年 / 84卷 / 05期

关键词：

D O I：

10.1103/PhysRevLett.84.971

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Hot-electron transport in Co/Cu/Co trilayer films has been studied in the energy range from 1.0 to 2.0 eV using ballistic electron magnetic microscopy. Both the spin-dependent attenuation lengths of Co and the cumulative polarizing effects of spin-dependent tunneling and transmission across a Co/Cu interface have been determined. For very thin (a few Angstrom) Co layers, the latter effects result in a weakly majority-spin polarized electron beam above similar to 1.3 eV and a minority-spin polarized beam below similar to 1.2 eV. For thicker Co layers the transmitted beam is always majority-spin polarized.

引用

页码：971 / 974

页数：4

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