Macroscopic size effects in second harmonic generation from Si(111) coated by thin oxide films: The role of optical casimir nonlocality

被引：16

作者：

Aktsipetrov, OA ^{[1
]}

Fedyanin, AA ^{[1
]}

Mishina, ED ^{[1
]}

Nikulin, AA ^{[1
]}

Rubtsov, AN ^{[1
]}

vanHasselt, CW ^{[1
]}

Devillers, MAC ^{[1
]}

Rasing, T ^{[1
]}

机构：

[1] CATHOLIC UNIV NIJMEGEN, INST MAT RES, NL-6525 ED NIJMEGEN, NETHERLANDS

来源：

PHYSICAL REVIEW LETTERS | 1997年 / 78卷 / 01期

关键词：

D O I：

10.1103/PhysRevLett.78.46

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Optical second harmonic generation from Si(111)-SiO2 interface shows a strong nonmonotonic dependence on the oxide thickness between 1 and 300 nm. The Brewster angle of incidence, pin, p-out combination of polarizations and strong, uniform suppression of this effect by near-index matching fluid exclude trivial multiple reflections and microscopic interface effects. The observation can be interpreted to originate from the optical (Casimir) nonlocality stemming from the thickness-dependent electron-electron interaction via virtual photons of the quantized electromagnetic field.

引用

页码：46 / 49

页数：4

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