Simulation of SiC deposition in a fiber coating CVD reactor

A simulation was carried out to study the Chemical Vapor Deposition (CVD) of SiC on a thin cylindrical substrate in a hot wall reactor. The results of this simulation are expected to apply to the process of fiber coating for interface control in fiber reinforced composites. The reactant in this study is methyltrichlorosilane (CH3SiCl3) in a background of hydrogen. The simulation was carried out using a commercial code (FLUENT). The simulation results compared well with experimental data from a hot wall reactor. It was determined that the temperature profiles tend to be uniform in the radial direction, and the deposition process is dominated by reaction kinetics.