GaN islanding by spontaneous rearrangement of a strained two-dimensional layer on (0001) AlN

被引:53
作者
Adelmann, C [1 ]
Gogneau, N [1 ]
Sarigiannidou, E [1 ]
Rouvière, JL [1 ]
Daudin, B [1 ]
机构
[1] CEA Grenoble, Dept Rech Fondamentale Mat Condensee, CEA CNRS Res Grp Nanophys & Semicond, SPMM, F-38054 Grenoble 9, France
关键词
D O I
10.1063/1.1515114
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is shown that a two-dimensional GaN layer grown on (0001) AlN under Ga-rich conditions remains two-dimensional while annealing under a Ga flux due to a surfactant effect of Ga. In contrast, further annealing under vacuum without the Ga flux leads to evaporation of excess Ga and to spontaneous transformation of the GaN layer into islands if the initial layer is thicker than about 2.5 monolayers. The resulting morphology is studied by atomic force microscopy and transmission electron microscopy. The latter reveals that these islands sit on top of a continuous 2.5 monolayer thick wetting layer, i.e., they represent a Stranski-Krastanow structure. (C) 2002 American Institute of Physics.
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页码:3064 / 3066
页数:3
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