Physical properties of sputtered ITO and WO3 thin films

被引:3
作者
Cui, HN
Teixeira, V
Monteiro, A
Fortunato, E
Martins, R
Bertran, E
机构
[1] Univ Minho, Dept Phys, GRF Funct Coatings Grp, PT-4800058 Guimaraes, Portugal
[2] Univ Nova Lisboa, Fac Ciencias & Tecnol, Dept Ciencia Mat, PL-2829516 Caparica, Portugal
[3] Univ Barcelona, E-08028 Barcelona, Spain
来源
ADVANCED MATERIALS FORUM II | 2004年 / 455-456卷
关键词
oxides; WO3; thin film; optical and electrical properties; dc sputtering;
D O I
10.4028/www.scientific.net/MSF.455-456.7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electrochromic coatings are used in a wide range of technical fields. This paper refers to the properties of amorphous Indium-tin-oxide (ITO) and WO3 thin films obtained by dc-magnetron reactive sputtering in different oxygen partial pressures (P-O2) at room temperature (RT). SEM, XRD and UV-Vis-NIR spectroscopy characterized the films prepared in terms of morphology, structure, and optical and electrical properties. The maximum of the optical transmittance in the visible range for the ITO and WO3 films was above 97% and 98%, respectively. These films were incorporated into ECDs (electrochromic devices) whose performance was assessed by optical methods.
引用
收藏
页码:7 / 11
页数:5
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