Simulation of damage production and accumulation in vanadium

被引:33
作者
Alonso, E
Caturla, MJ
de la Rubia, TD
Perlado, JM
机构
[1] Univ Calif Lawrence Livermore Natl Lab, Livermore, CA 94550 USA
[2] Inst Fus Nucl, Madrid 28006, Spain
关键词
D O I
10.1016/S0022-3115(99)00181-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Energetic atoms which have been knocked-off their lattice sites by neutron or ion irradiation leave a trail of vacancies and interstitials in their wake. Most of these defects recombine with their opposites within their own collision cascade. Some fraction, however, escape to become freely migrating defects (FMD) in the bulk of the material. The interaction of FMD with the microstructure has long been linked to changes in the macroscopic properties of materials under irradiation. We calculate the fraction of FMD in pure vanadium for a wide range of temperatures and primary knock-on atom (PKA) energies. The collision cascade database is obtained from molecular dynamics (MD) simulations with an embedded atom method (EAM) potential. The actual FMD calculation is carried out by a kinetic Monte Carlo (kMC) code with a set of parameters extracted either from the experimental literature or from MD simulations. Annealing each individual cascade at different temperatures allows the mobile species to escape and account for FMD. We also analyze damage accumulation in a specimen irradiated at low dose rate in the presence of impurities. At the temperature studied, beginning of stage V, we observe that only vacancies are free to move whereas most interstitials are stopped by impurities. We also analyze the role of impurities on damage accumulation and on the concentration of mobile defects. (C) 2000 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:221 / 229
页数:9
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