Adsorption mechanism of gallium(III) and indium(III) onto gamma-Al2O3

被引:20
作者
Lin, CF
Chang, KS
Tsay, CW
Lee, DY
Lo, SL
Yasunaga, T
机构
[1] NATL LIEN HO COLL TECHNOL & COMMERCE, DEPT ENVIRONM ENGN, MIAOLI 360, TAIWAN
[2] NATL TAIWAN UNIV, GRAD INST AGR CHEM, TAIPEI 106, TAIWAN
关键词
Ga(III); In(III); gamma-Al2O3; adsorption; water exchange rate; linear free energy; intrinsic adsorption rate constants;
D O I
10.1006/jcis.1996.4739
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adsorption mechanism of trivalent Ga and In onto gamma-Al2O3 was investigated using a triple-layer model simulation and pressure-jump technique, Bidentate Ga3+ and In3+ and monodentate GaOH2+/InOH2+ are the most likely surface species responsible for Ga(III)/In(III) adsorption, Sorption of Ga(III) and In(III) can be interpreted as an associative process, The adsorption pathway is a two-step mechanism: proton release from surface hydroxyl group(s) followed by coordination of Ga(III)/In(III) species to the depronated site(s), Intrinsic adsorption rate constants cannot be estimated with a liner free-energy relationship between the adsorption rate constant and the rate of water exchange, which is developed solely based on the dissociative sorption mechanism of divalent ions. (C) 1997 Academic Press.
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页码:201 / 208
页数:8
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