RETRACTED: Cathodic electrodeposition of RuO2 thin films from Ru(III)Cl3 solution (Retracted article. See vol. 226, pg. 387, 2019)

被引：44

作者：

Park, BO

Lokhande, CD

Park, HS

Jung, KD

Joo, OS

机构：

[1] Korea Inst Sci & Technol, Eco Nano Res Ctr, Seoul 13650, South Korea

[2] Sogang Univ, Seoul, South Korea

来源：

MATERIALS CHEMISTRY AND PHYSICS | 2004年 / 87卷 / 01期

关键词：

ruthenium oxide; electrodeposition; thin films; structural studies; SEM and TEM studies;

D O I：

10.1016/j.matchemphys.2004.04.023

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ruthenium oxide (RuO2) films of different thicknesses have been cathodically deposited on titanium substrates under galvanostatic condition from aqueous acidic Ru(III)Cl-3 Solution. The deposition conditions and structural properties of these films have been studied. The X-ray diffraction (XRD) and transmission electron microscopy (TEM) studies revealed that as-deposited RuO2 film is nanocrystalline. The scanning electron microscopy (SEM) study showed that RuO2 film is porous and the surface morphology changes with film thickness. (C) 2004 Published by Elsevier B.V.

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页码：59 / 66

页数：8

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