Site-selective spectroscopy of Er in GaN

被引:57
作者
Dierolf, V
Sandmann, C
Zavada, J
Chow, P
Hertog, B
机构
[1] Lehigh Univ, Dept Phys, Bethlehem, PA 18015 USA
[2] Lehigh Univ, Lehigh Ctr Opt Technol, Bethlehem, PA 18015 USA
[3] USA, Res Off, Res Triangle Pk, NC 27709 USA
[4] SVT Associates Inc, Eden Prairie, MN 55344 USA
关键词
D O I
10.1063/1.1695595
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigated different Er3+ defect sites found in Er-doped GaN layers by site-selective combined excitation-emission spectroscopy and studied the role of these sites in different direct and multistep excitation schemes. The layers were grown by molecular beam epitaxy and were 200 nm thick. Two majority sites were found along with several minority sites. The sites strongly differ in excitation and energy transfer efficiencies as well as branching ratios during relaxation. For this reason, relative emission intensities from these sites depend strongly on emission and excitation. The sites were identified for several transitions and a comprehensive list of energy levels has been compiled. One of the minority sites appears strongly under ultraviolet excitation above the GaN band gap suggesting that this site is an excellent trap for excitation energy of electron-hole pairs. (C) 2004 American Institute of Physics.
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收藏
页码:5464 / 5470
页数:7
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