Excimer laser ablation and film deposition of Ti:Sapphire

被引：19

作者：

Dyer, PE

Jackson, SR

Key, PH

Metheringham, WJ

Schmidt, MJJ

机构：

[1] Department of Applied Physics, University of Hull, Hull

来源：

APPLIED SURFACE SCIENCE | 1996年 / 96-8卷

基金：

英国工程与自然科学研究理事会;

关键词：

D O I：

10.1016/0169-4332(95)00565-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

ArF laser ablation of Ti:sapphire (Ti:Al2O3) has been investigated as a potential means for micromachining this laser crystal and depositing thin layers for use as active waveguides. Plume spectra recorded for ablation in low pressure oxygen and a preliminary assessment of layers grown by this method are reported.

引用

页码：849 / 854

页数：6

共 11 条

[1] STUDIES OF THE OPTICAL AND STRUCTURAL-PROPERTIES OF ION-ASSISTED DEPOSITED AL2O3 THIN-FILMS [J].