Formation and photooxidation of n-dodecanethiol self-assembled monolayers on Au(111): 'Pits' formed during chemisorption disappear upon oxidation

被引：16

作者：

Dishner, MH ^{[1
]}

Feher, FJ ^{[1
]}

Hemminger, JC ^{[1
]}

机构：

[1] UNIV CALIF IRVINE,DEPT CHEM,IRVINE,CA 92717

来源：

CHEMICAL COMMUNICATIONS | 1996年 / 16期

关键词：

D O I：

10.1039/cc9960001971

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

UV photolysis in air of self-assembled n-dodecanethiol monolayers (SAMs) on Au(111) quantitatively oxidizes the adsorbed thiol to its corresponding sulfonate and completely destroys the ordered structure of the SAM without exposing the underlying gold surface; STM images indicate that the etch pits which appear to form during chemisorption of the thiol are lost when the thiol is oxidized.

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页码：1971 / 1972

页数：2

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