Optics developments in the VUV - soft X-ray spectral region

被引：10

作者：

Feigl, T ^{[1
]}

Heber, J ^{[1
]}

Gatto, A ^{[1
]}

Kaiser, N ^{[1
]}

机构：

[1] Fraunhofer Inst Angew Opt & Feinmech, D-07745 Jena, Germany

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2002年 / 483卷 / 1-2期

关键词：

VUV; EUV; soft X-ray; multilayer optics; microlithography;

D O I：

10.1016/S0168-9002(02)00342-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the search for technological innovations and improvements. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. This paper covers some theoretical considerations, material aspects, design and different techniques of controlled fabrication of multilayer coated optics. Their potential applications for microlithography as well as alternative application fields like microscopy, spectroscopy, soft X-ray lasers and free electron lasers are also discussed. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：351 / 356

页数：6

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