Molecular depth profiling of multi-layer systems with cluster ion sources

被引:28
作者
Cheng, Juan [1 ]
Winograd, Nicholas [1 ]
机构
[1] Penn State Univ, Dept Chem, University Pk, PA 16802 USA
基金
美国国家科学基金会; 美国国家卫生研究院;
关键词
molecular depth profiling; trehalose film; multi-layer; cluster ion; ToF-SIMS; C-60(+);
D O I
10.1016/j.apsusc.2006.02.207
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Cluster bombardment of molecular films has created new opportunities for SIMS research. To more quantitatively examine the interaction of cluster beams with organic materials, we have developed a reproducible platform consisting of a well-defined sugar film (trehalose) doped with peptides. Molecular depth profiles have been acquired with these systems using C-60(+) bombardment. In this study, we utilize this platform to determine the feasibility of examining buried interfaces for multi-layer systems. Using C-60(+) at 20 keV, several systems have been tested including Al/trehalose/Si, Al/trehalose/Al/Si, Ag/trehalose/Si and ice/trehalose/Si. The results show that there can be interactions between the layers during the bombardment process that prevent a simple interpretation of the depth profile. We find so far that the best results are obtained when the mass of the overlayer atoms is less than or nearly equal to the mass of the atoms in buried molecules. In general, these observations suggest that C-60(+) bombardment can be successfully applied to interface characterization of multi-layer systems if the systems are carefully chosen. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:6498 / 6501
页数:4
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