Morphology and lattice coherency in GaAs nanocrystals grown on Si(100) surface

被引:17
作者
Usui, Hiroyuki [1 ]
Yasuda, Hidehiro
Mori, Hirotaro
机构
[1] Kobe Univ, Venture Business Lab, Kobe, Hyogo 6578501, Japan
[2] Kobe Univ, Dept Engn Mech, Kobe, Hyogo 6578501, Japan
[3] Osaka Univ, Res Ctr Ultra High Voltage Electron Microscopy, Suita, Osaka 5650871, Japan
关键词
D O I
10.1063/1.2363147
中图分类号
O59 [应用物理学];
学科分类号
摘要
Morphology and structure in GaAs nanocrystals grown on Si(100) substrate were studied to investigate the relation between lattice coherency and growth mechanism. GaAs nanocrystals formed (100) and {111} facets, and rectangular base with four sides along [011] and [011] directions. Either the (011) or the (0 (1) over bar1) lattice planes along the minor axis of the rectangular base are completely coherent with those in Si substrate. When either the (0 (1) over bar1) or the (011) lattice planes become partially coherent to relax the lattice strain, the growth rate along the direction parallel to the unstrained (0 (1) over bar1) or (011) planes which prevents each area of the strained (011) or (0 (1) over bar1) planes from increasing remarkably increases. (c) 2006 American Institute of Physics.
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页数:3
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