Leakage current characteristics of laser-ablated SrBi2Nb2O9 thin films

被引:21
作者
Das, RR
Bhattacharya, P
Pérez, W
Katiyar, RS [1 ]
Bhalla, AS
机构
[1] Univ Puerto Rico, Dept Phys, Rio Piedras, PR 00931 USA
[2] Penn State Univ, Mat Res Lab, University Pk, PA 16802 USA
关键词
D O I
10.1063/1.1495880
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied the leakage current conduction mechanism of pulsed-laser-deposited SrBi2Nb2O9 (SBN) thin films on platinized silicon substrates. The time-dependent dc leakage current densities of SBN thin films do not follow Curie-von Schweidler power law. Instead the contribution of conduction current is predominantly electronic. At lower fields, the leakage current follows the ohmic behavior, and it increases exponentially for higher fields. The leakage current density of the SBN thin films was studied at elevated temperatures, and the data were fitted with the Schottky emission model. The effective Richardson's constant was calculated to be about 8.7x10(-6) A/cm(2) K-2. The Schottky barrier height of the SBN thin films was estimated to be 1.37 eV. (C) 2002 American Institute of Physics.
引用
收藏
页码:880 / 882
页数:3
相关论文
共 14 条
[1]   The physics of ferroelectric memories [J].
Auciello, O ;
Scott, JF ;
Ramesh, R .
PHYSICS TODAY, 1998, 51 (07) :22-27
[2]   Alternating current conduction behavior of excimer laser ablated SrBi2Nb2O9 thin films [J].
Bhattacharyya, S ;
Bharadwaja, SSN ;
Krupanidhi, SB .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (07) :4294-4302
[3]  
Das R.R., 2001, MATER RES SOC S P, V655
[4]   FATIGUE-FREE FERROELECTRIC CAPACITORS WITH PLATINUM-ELECTRODES [J].
DEARAUJO, CAP ;
CUCHIARO, JD ;
MCMILLAN, LD ;
SCOTT, MC ;
SCOTT, JF .
NATURE, 1995, 374 (6523) :627-629
[5]   Leakage currents in Ba0.7Sr0.3TiO3 thin films for ultrahigh-density dynamic random access memories [J].
Dietz, GW ;
Schumacher, M ;
Waser, R ;
Streiffer, SK ;
Basceri, C ;
Kingon, AI .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (05) :2359-2364
[6]   Atomic environment of tantalum in the intermediate fluorite phase of SrBi2Ta2O9 thin films [J].
Hartmann, AJ ;
Gutleben, CD ;
Foran, GJ ;
Whitby, CP ;
Lamb, RN ;
Isobe, C ;
Watanabe, K ;
Scott, JF .
FERROELECTRICS LETTERS SECTION, 1997, 23 (3-4) :75-80
[7]  
Jonscher A. K., 1983, DIELECTRIC RELAXATIO
[8]   Schottky barrier heights of tantalum oxide, barium strontium titanate, lead titanate, and strontium bismuth tantalate [J].
Robertson, J ;
Chen, CW .
APPLIED PHYSICS LETTERS, 1999, 74 (08) :1168-1170
[9]   Structural and electrical characterization of SrBi2Nb2O9 thin films deposited on YBa2Cu3O7-δ and Nb doped SrTiO3 [J].
Schwan, C ;
Haibach, P ;
Jakob, G ;
Martínez, JC ;
Adrian, H .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (02) :960-964
[10]   Device physics of ferroelectric thin-film memories [J].
Scott, JF .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1999, 38 (4B) :2272-2274