Effects of electrical leakage currents on MEMS reliability and performance

被引:66
作者
Shea, HR
Gasparyan, A
Chan, HB
Arney, S
Frahm, RE
López, D
Jin, SH
McConnell, RP
机构
[1] Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
[2] Agere Syst, Murray Hill, NJ 07974 USA
关键词
anodic oxidation; charge dissipation layer; dielectric charging; MEMS reliability;
D O I
10.1109/TDMR.2004.826350
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electrostatically driven MEMS devices commonly operate with electric fields as high at 10(8) V/m applied across the dielectric between electrodes. Even with the best mechanical design, the electrical design of these devices has a large impact both on performance (e.g., speed and stability) and on reliability (e.g., corrosion and dielectric or gas breakdown). In this paper, we discuss the reliability and performance implications of leakage currents in the bulk and on the surface of the dielectric insulating the drive (or sense) electrodes from one another. Anodic oxidation of poly-silicon electrodes can occur very rapidly in samples that are not hermetically packaged. The accelerating factors are presented along with an efficient early-warning scheme. The relationship between leakage currents and the accumulation of quasistatic charge in dielectrics are discussed, along with several techniques to mitigate charging and the associated drift in electrostatically actuated or sensed MEMS devices. Two key parameters are shown to be the electrode geometry and the conductivity of the dielectric. Electrical breakdown in submicron gaps is presented as a function of packaging gas and electrode spacing. We discuss the tradeoffs involved in choosing gap geometries and dielectric properties that balance performance and reliability.
引用
收藏
页码:198 / 207
页数:10
相关论文
共 28 条
[1]   Designing for MEMS reliability [J].
Arney, S .
MRS BULLETIN, 2001, 26 (04) :296-299
[2]   Characterization of contact electromechanics through capacitance-voltage measurements and simulations [J].
Chan, EK ;
Garikipati, K ;
Dutton, RW .
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1999, 8 (02) :208-217
[3]  
COMIZZOLI RB, 1991, MATERIALS DEVELOPMENTS IN MICROELECTRONIC PACKAGING : PERFORMANCE AND RELIABILITY, P311
[4]  
CRANK J, 1997, MATH DIFFUSION, P47
[5]  
EHMKE J, 2002, Patent No. 6391675
[6]  
GASPARYAN A, 2003, P OPT FIB COMM C EXH
[7]  
Goldsmith C, 2001, IEEE MTT-S, P227, DOI 10.1109/MWSYM.2001.966876
[8]  
JIN SW, UNPUB
[9]   1100 x 1100 port MEMS-based optical crossconnect with 4-dB maximum loss [J].
Kim, J ;
Nuzman, CJ ;
Kumar, B ;
Lieuwen, DF ;
Kraus, JS ;
Weiss, A ;
Lichtenwalner, CP ;
Papazian, AR ;
Frahm, RE ;
Basavanhally, NR ;
Ramsey, DA ;
Aksyuk, VA ;
Pardo, F ;
Simon, ME ;
Lifton, V ;
Chan, HB ;
Haueis, M ;
Gasparyan, A ;
Shea, HR ;
Arney, S ;
Bolle, CA ;
Kolodner, PR ;
Ryf, R ;
Neilson, DT ;
Gates, JV .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2003, 15 (11) :1537-1539
[10]   ANODIC OXIDES ON SILICON [J].
LEWERENZ, HJ .
ELECTROCHIMICA ACTA, 1992, 37 (05) :847-864