Optimization of properties of carbon nitride and CNx/TiN coatings prepared by single-cathode magnetron sputtering

被引：14

作者：

Marumo, Y

Yang, ZD

Chung, YW

机构：

[1] Dept. of Mat. Sci. and Engineering, Robert R. McCormick Sch. Eng. A., Northwestern University, Evanston

来源：

SURFACE & COATINGS TECHNOLOGY | 1996年 / 86-7卷 / 1-3期

基金：

美国国家科学基金会;

关键词：

carbon nitride coating; CNx/TiN coating; single-cathode magnetron sputtering;

D O I：

10.1016/S0257-8972(96)03008-3

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A single-cathode magnetron sputtering system was used to deposit CNx and CNx/TiN coatings onto Si (100) and polished M2 substrates. It was shown that optimum choice of substrate bias and pressure is required to obtain smooth films with maximum hardness and wear performance for carbon nitride. This work shows that it is possible to obtain CNx/TiN composite films using the same single-cathode approach, although the C/Ti ratio required to achieve the best hardness and wear properties has yet to be optimized.

引用

收藏

页码：586 / 591

页数：6

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