Atomic Layer Deposition of Ceria-based Thin Films as Interlayer for Solid Oxide Fuel Cells

被引:2
作者
Fan, Zeng [1 ]
Prinz, Fritz B. [1 ]
机构
[1] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
来源
SOLID OXIDE FUEL CELLS 11 (SOFC-XI) | 2009年 / 25卷 / 02期
关键词
LOW-TEMPERATURE;
D O I
10.1149/1.3205618
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Traditional YSZ electrolyte membranes benefit from stability and acceptable ionic conductivity at elevated temperatures (above 500 degrees C). However, at operating temperatures below 500 degrees C, the charge transfer reaction at the cathode/electrolyte interface becomes very slow and causes significant cathode activation overpotential. Ceria based thin films, like Yttria doped Ceria and Gadolinia doped Ceria, possess higher oxide ion diffusivities and can be potentially used as interlayer between cathode and YSZ electrolyte in order to facilitate the charge transfer kinetics at lower temperatures. In this work, we have focused on growing high quality YDC thin films by atomic layer deposition method and optimizing the growing parameters. Thin films were characterized by X-Ray Diffraction and X-ray Photoelectron Spectroscopy techniques. Prototyping work is being conducted on fuel cells with YDC as interlayer by ALD. The performance of SOFCs with YDC surface coatings on the cathode will be reported.
引用
收藏
页码:959 / 967
页数:9
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