In-situ investigation of patterned magnetic domain structures using magnetic force microscope

被引:5
作者
Wu, JC [1 ]
Huang, HW
Huang, YW
Wu, TH
机构
[1] Natl Changhua Univ Educ, Dept Phys, Changsha 500, Peoples R China
[2] Natl Yunlin Univ Sci & Technol, Dept Humanitiites & Sci, Touliu, Yunlin, Taiwan
关键词
electron beam lithography; magnetic domain structures; magnetic force microscope;
D O I
10.1109/20.800564
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel method for in-situ investigation of patterned magnetic domain structures is presented. Micron-length scales of permalloy thin film fabricated by a lift-off process using electron beam lithography were placed on the top and adjacent to an Aluminum strip. A magnetic force microscope was used to take continuous images of the patterned permalloy films while an electrical current was applied in the aluminum strip, with which a magnetic field was established through the patterned permalloy films in the perpendicular and plane direction. As a result, changes of the magnetic domain structures were observed in the presence of the applied magnetic field.
引用
收藏
页码:3481 / 3483
页数:3
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