Plastic deformation of freestanding thin films: Experiments and modeling

被引:183
作者
Nicola, L.
Xiang, Y.
Vlassak, J. J.
Van der Giessen, E.
Needleman, A. [1 ]
机构
[1] Brown Univ, Div Engn, Providence, RI 02912 USA
[2] Harvard Univ, Div Engn & Appl Sci, Cambridge, MA 02138 USA
[3] Univ Groningen, Dept Appl Phys, NL-9747 AG Groningen, Netherlands
基金
美国国家科学基金会;
关键词
dislocations; thin films; Bauschinger effect; size effects; computer simulation;
D O I
10.1016/j.jmps.2006.04.005
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Experimental measurements and computational results for the evolution of plastic deformation in freestanding thin films are compared. In the experiments, the stress-strain response of two sets of Cu films is determined in the plane-strain bulge test. One set of samples consists of electroplated Cu films, while the other set is sputter-deposited. Unpassivated films, films passivated on one side and films passivated on both sides are considered. The calculations are carried out within a two-dimensional plane strain framework with the dislocations modeled as line singularities in an isotropic elastic solid. The film is modeled by a unit cell consisting of eight grains, each of which has three slip systems. The film is initially free of dislocations which then nucleate from a specified distribution of Frank-Read sources. The grain boundaries and any film-passivation layer interfaces are taken to be impenetrable to dislocations. Both the experiments and the computations show: (i) a flow strength for the passivated films that is greater than for the unpassivated films and (ii) hysteresis and a Bauschinger effect that increases with increasing pre-strain for passivated films, while for unpassivated films hysteresis and a Bauschinger effect are small or absent. Furthermore, the experimental measurements and computational results for the 0.2% offset yield strength stress, and the evolution of hysteresis and of the Bauschinger effect are in good quantitative agreement. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:2089 / 2110
页数:22
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