Sol-gel route for electrophoretic deposition of mullite diffusion barriers on C/C-SiC composites

被引:9
作者
Damjanovic, T [1 ]
Leipner, H
Argirusis, C
Herbig, R
Weiss, R
Tomandl, G
Borchardt, G
机构
[1] Tech Univ Clausthal, Inst Met, Clausthal Zellerfeld, Germany
[2] TU Bergakad Freiberg, Inst Keram Werkstoffe, Freiberg, Germany
[3] Schunk Kohlenstofftech GmbH, Giessen, Germany
来源
PROGRESS IN ADVANCED MATERIALS AND PROCESSES | 2004年 / 453-454卷
关键词
EPD; mullite; oxidation kinetics; sol-gel technology; thermogravimetry;
D O I
10.4028/www.scientific.net/MSF.453-454.343
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electrophoretic deposition (EPD) is a technique, which allows LIS to produce thick mullite coatings on Substrates with complex geometries at low cost of production. Combining sol-gel synthesis of 3Al(2)O(3).2SiO(2) mullite through hydrolysis and condensation of tetraethoxysilane (TEOS) and aluminum-tri-sec-butylate (Al-(OBU)(3)) with EPD yields sufficiently thick and homogeneous layers which transform into mullite at 1300 degreesC. Reproducible mullite oxidation barriers were obtained.
引用
收藏
页码:343 / 348
页数:6
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