Magnetorheological finishing

被引:242
作者
Kordonski, WI [1 ]
Jacobs, SD [1 ]
机构
[1] UNIV ROCHESTER,ROCHESTER,NY 12623
来源
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 1996年 / 10卷 / 23-24期
关键词
D O I
10.1142/S0217979296001288
中图分类号
O59 [应用物理学];
学科分类号
摘要
The technology of finishing for optics, ceramics, and semiconductors is one of the most promising uses of the magnetorheological effect. It perfectly coupled with computer control, allowing in quantity production the unique accuracy and quality of a polished surface to be achieved. The polishing process may appear as follows. A part rotating on the spindle is brought into contact with an magnetorheological polishing (MRP) fluid which is set in motion by the moving wall. In the region where the part and the MRP fluid are brought into contact, the applied magnetic field creates the conditions necessary for the material removal from the part surface. The material removal takes place in a certain region contacting the surface of the part which can be called the polishing spot or zone. The polishing process comes to the program-simulated movement of the polishing spot over the part surface. The mechanism of the material removal in the contact zone is considered as a process governed by the particularities of the Bingham now in the contact zone. The problem like the hydrodynamic theory of lubrication is treated for plastic film. As this takes place the shear stresses distribution in the film is obtained from the experimental measurements of the pressure distribution in the contact spot. Reasonable correlation between calculated and experimental magnitudes of the material removal rate for glass polishing lends support to the validity of the approach.
引用
收藏
页码:2837 / 2848
页数:12
相关论文
共 14 条
[1]  
ALI I, 1994, SOLID STATE TECH OCT
[2]   THE MATERIAL REMOVAL MECHANISM IN MAGNETIC FLUID GRINDING OF CERAMIC BALL-BEARINGS [J].
CHILDS, THC ;
MAHMOOD, S ;
YOON, HJ .
PROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART B-JOURNAL OF ENGINEERING MANUFACTURE, 1994, 208 (01) :47-59
[3]   CHEMICAL PROCESSES IN GLASS POLISHING [J].
COOK, LM .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1990, 120 (1-3) :152-171
[4]  
Fox M., 1994, ANN CIRP, V43, P181, DOI DOI 10.1016/S0007-8506(07)62191-X
[5]  
GORMLEY J, 1991, REV SCI INSTRUM, V52, P1256
[6]  
GROSS WA, 1980, FLUID FILM LUBRICATI, P774
[7]  
KORDONSKI W, 1994, OSA OPTICAL FAB TEST, V13, P104
[8]   MECHANISM OF ATOMIC REMOVAL IN ELASTIC EMISSION MACHINING [J].
MORI, Y ;
YAMAUCHI, K ;
ENDO, K .
PRECISION ENGINEERING-JOURNAL OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING, 1988, 10 (01) :24-28
[9]  
MORI Y, 1985, J JAPAN SOC PRECISIO, V51, P1187
[10]  
Saito Y., 1987, P 6 INT C PROD ENG O, P335