Wettability, chemical and morphological data of hydrophobic layers by plasma polymerization on smooth substrates

被引：26

作者：

Elkin, B ^{[1
]}

Mayer, J ^{[1
]}

Schindler, B ^{[1
]}

Vohrer, U ^{[1
]}

机构：

[1] Fraunhofer Inst Grenzflachen & Bioverfahrenstech, IGB, D-70569 Stuttgart, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 1999年 / 116卷

关键词：

hydrophobic layers; plasma polymerization; wettability;

D O I：

10.1016/S0257-8972(99)00352-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Plasma polymer layers were deposited from perfluoropropene plasma on rough and polished silicon wafers. Deposition was performed in a novel plasma apparatus using a special electrode arrangement for high lateral homogeneity of the deposits. The deposition parameters were optimized to develop highly hydrophobic layers with good de-wetting properties and adherence. The best results could be achieved by using a pulse plasma with on/off ratios of 1/5 ms. The water contact angle under receding conditions could be enhanced up to 97 degrees. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：836 / 840

页数：5

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