Buffer layers for narrow bandgap a-SiGe solar cells

被引:2
作者
Liao, XB [1 ]
Walker, J [1 ]
Deng, X [1 ]
机构
[1] Univ Toledo, Dept Phys & Astron, Toledo, OH 43606 USA
来源
AMORPHOUS AND HETEROGENEOUS SILICON THIN FILMS: FUNDAMENTALS TO DEVICES-1999 | 1999年 / 557卷
关键词
D O I
10.1557/PROC-557-779
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In high efficiency narrow bandgap (NBG) a-SiGe solar cells, thin buffer layers of unalloyed hydrogenated amorphous silicon (a-Si) are usually used at the interfaces between the a-SiGe intrinsic layer and the doped layers. We investigated the effect of inserting additional a-SiGe interface layers between these a-Si buffer layers and the a-SiGe absorber layer. We found that such additional interface layers increase solar cell V-oc and FF sizably. most likely due to the reduction or elimination of the abrupt bandgap discontinuity between the a-SiGe absorber layer and the a-Si buffer layers. With these improved narrow bandgap solar cells incorporated into the fabrication of triple-junction a-Si based solar cells, we obtained triple cells with initial efficiency of 10.6%.
引用
收藏
页码:779 / 784
页数:6
相关论文
共 5 条
[1]  
DENG X, 1994, 1 NRELTP41120687
[2]   FLUORINATED AMORPHOUS SILICON-GERMANIUM ALLOYS DEPOSITED FROM DISILANE GERMANE MIXTURE [J].
GUHA, S ;
PAYSON, JS ;
AGARWAL, SC ;
OVSHINSKY, SR .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 97-8 :1455-1458
[3]  
SZE SM, 1981, PHYSICS SEMICONDUCTO
[4]  
Tsuo Y. S., 1990, Applied Physics Communications, V10, P71
[5]   AMORPHOUS SILICON-GERMANIUM ALLOY SOLAR-CELLS WITH PROFILED BAND-GAPS [J].
YANG, J ;
ROSS, R ;
GLATFELTER, T ;
MOHR, R ;
GUHA, S .
AMORPHOUS SILICON TECHNOLOGY - 1989, 1989, 149 :435-440