Electronic properties of microcrystalline silicon investigated by electron spin resonance and transport measurements

被引:62
作者
Finger, F [1 ]
Müller, J [1 ]
Malten, C [1 ]
Carius, R [1 ]
Wagner, H [1 ]
机构
[1] Forschungszentrum Julich, ISI PV, D-52425 Julich, Germany
关键词
D O I
10.1016/S0022-3093(99)00802-9
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The electron spin resonance and transport properties of microcrystalline silicon were investigated. Identification and location of the resonance states in the material are discussed. We analyse the properties of the conduction electron resonance and the relation of the corresponding states with electronic transport. Conduction band tail states within the crystalline regions of the material an proposed as a requirement for the interpretation of the experimental results. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:511 / 518
页数:8
相关论文
共 25 条
[1]   Electronic properties of microcrystalline silicon [J].
Carius, R ;
Finger, F ;
Backhausen, U ;
Luysberg, M ;
Hapke, P ;
Houben, L ;
Otte, M ;
Overhof, H .
AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997, 1997, 467 :283-294
[2]  
CARIUS R, 1999, THIN FILM MAT DEVICE, P157
[3]  
CHROBOCZEK JA, 1987, NONCRYSTALLINE SEMIC, V3, P109
[4]   Electronic states in hydrogenated microcrystalline silicon [J].
Finger, F ;
Muller, J ;
Malten, C ;
Wagner, H .
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1998, 77 (03) :805-830
[5]   IMPROVEMENT OF GRAIN-SIZE AND DEPOSITION RATE OF MICROCRYSTALLINE SILICON BY USE OF VERY HIGH-FREQUENCY GLOW-DISCHARGE [J].
FINGER, F ;
HAPKE, P ;
LUYSBERG, M ;
CARIUS, R ;
WAGNER, H ;
SCHEIB, M .
APPLIED PHYSICS LETTERS, 1994, 65 (20) :2588-2590
[6]   FREE-ELECTRONS AND DEFECTS IN MICROCRYSTALLINE SILICON STUDIED BY ELECTRON-SPIN-RESONANCE [J].
FINGER, F ;
MALTEN, C ;
HAPKE, P ;
CARIUS, R ;
FLUCKIGER, R ;
WAGNER, H .
PHILOSOPHICAL MAGAZINE LETTERS, 1994, 70 (04) :247-254
[7]   High deposition rates for microcrystalline silicon with low temperature plasma enhanced chemical vapor deposition processes [J].
Hapke, P ;
Finger, F .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1998, 227 :861-865
[8]   Structural properties of microcrystalline silicon in the transition from highly crystalline to amorphous growth [J].
Houben, L ;
Luysberg, M ;
Hapke, P ;
Carius, R ;
Finger, F ;
Wagner, H .
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1998, 77 (06) :1447-1460
[9]   Paramagnetic defects in undoped microcrystalline silicon deposited by the hot-wire technique [J].
Kanschat, P ;
Lips, K ;
Brüggemann, R ;
Hierzenberger, A ;
Sieber, I ;
Fuhs, W .
AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, 1998, 507 :793-798
[10]   Structure and growth of hydrogenated microcrystalline silicon: Investigation by transmission electron microscopy and Raman spectroscopy of films grown at different plasma excitation frequencies [J].
Luysberg, M ;
Hapke, P ;
Carius, R ;
Finger, F .
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1997, 75 (01) :31-47