Characterization of the surface to thiol bonding in self-assembled monolayer films of C12H25SH on InP(100) by angle-resolved X-ray photoelectron spectroscopy

被引：35

作者：

Yamamoto, H ^{[1
]}

Butera, RA ^{[1
]}

Gu, Y ^{[1
]}

Waldeck, DH ^{[1
]}

机构：

[1] Univ Pittsburgh, Dept Chem, Pittsburgh, PA 15260 USA

来源：

LANGMUIR | 1999年 / 15卷 / 25期

关键词：

D O I：

10.1021/la990467r

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Angle-resolved X-ray photoelectron spectroscopy (ARXPS) was used to characterize the bonding of alkanethiols to n-InP surfaces and to measure the monolayer thickness. A careful comparison of the angle-dependent spectra for three different sample preparations (oxidized InP(100), HF-etched InP(100), and HF-etched InP(100) with a self-assembled monolayer of C12H25SH) shows that the sulfur binds to In atoms on the surface. Comparison of the angle-dependence of the intensity ratios for the In 3d(5/2) core level of InP with the self-assembled monolayer (SAM) to that of sputtered InP provides a thickness for the SAM. of 14 +/- 4 Angstrom, corresponding to alkane chains at a tilt angle of 44 +/- 16 degrees from the surface normal.

引用

页码：8640 / 8644

页数：5

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